The evaluation of thin film insulators
- 1 July 1968
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 2 (1-2), 1-26
- https://doi.org/10.1016/0040-6090(68)90010-2
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Properties of Insulating Thin Films Deposited by RF SputteringIBM Journal of Research and Development, 1967
- Dielectric Thin Films through rf SputteringJournal of Applied Physics, 1966
- Sputtering Studies of Insulators by Means of Langmuir ProbesJournal of Applied Physics, 1965
- Refractive Index of SiO2 Films Grown on SiliconJournal of Applied Physics, 1965
- Structural Evaluation of Silicon Oxide FilmsJournal of the Electrochemical Society, 1965
- Evidence for Oxidation Growth at the Oxide-Silicon Interface from Controlled Etch StudiesJournal of the Electrochemical Society, 1964
- Une technique simple pour mesurer l'épaisseur et l'indice de réfraction de couches transparentes sans les altérerJournal de Physique, 1964
- Nondestructive Determination of Thickness and Refractive Index of Transparent FilmsIBM Journal of Research and Development, 1964
- Das ultrarote Reflexionsspektrum von Silikaten. IIThe European Physical Journal A, 1936
- Das ultrarote Reflexionsspektrum von SilikatenThe European Physical Journal A, 1934