Characterization of a positive-tone wet silylation process with the AZ 5214TM photoresist
- 30 April 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 21 (1-4), 263-266
- https://doi.org/10.1016/0167-9317(93)90069-h
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- X-ray photoelectron spectroscopy and infrared study of the processing of a silylated positive photoresistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- A simplified silylation processJournal of Vacuum Science & Technology B, 1989
- Effects of silylation parameters on the lithographic performance of the desire systemMicroelectronic Engineering, 1986