The effect of surface roughness on XPS and AES
- 2 April 1984
- journal article
- Published by Elsevier in Surface Science
- Vol. 139 (2-3), 541-548
- https://doi.org/10.1016/0039-6028(84)90068-2
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- ESCA signal intensity dependence on surface area (roughness)Applications of Surface Science, 1982
- Auger signal intensity dependence on surface area (roughness)Journal of Vacuum Science and Technology, 1982
- A critical analysis on the origin, stability, relative sputtering yield and related phenomena of textured surfaces under ion bombardmentRadiation Effects, 1982
- Interpretation of AES depth profiles of porous Al anodic oxidesApplications of Surface Science, 1980
- Microroughness induced on solids by ion bombardment: I. Experimental results on sputtering of aluminium by A+ (15 keV); quantification of microroughnessSurface Science, 1979
- The development of surface topography during depth profiling in auger electron spectroscopySurface Science, 1979
- Concentration profiles for irregular surfaces from x-ray photoelectron angular distributionsAnalytical Chemistry, 1976
- The effect of surface roughness on Auger electron spectroscopyJournal of Electron Spectroscopy and Related Phenomena, 1975
- Instrumentation for surface studies: XPS angular distributionsJournal of Electron Spectroscopy and Related Phenomena, 1974
- Surface analysis and angular distributions in x-ray photoelectron spectroscopyJournal of Electron Spectroscopy and Related Phenomena, 1974