Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions
- 15 September 1992
- journal article
- Published by Elsevier in Surface Science
- Vol. 275 (3), 407-413
- https://doi.org/10.1016/0039-6028(92)90813-l
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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