On the investigation of d.c. plasmatron discharges by optical emission spectrometry
- 15 October 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 96 (3), 235-240
- https://doi.org/10.1016/0040-6090(82)90247-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Mechanisms of reactive sputtering of indium I: Growth of InN in mixed Ar-N2 dischargesThin Solid Films, 1980
- Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter depositionJournal of Vacuum Science and Technology, 1978
- Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film ThicknessJournal of Vacuum Science and Technology, 1973
- A spectroscopic investigation of the reactive sputtering of aluminiumThin Solid Films, 1971