An integrated laboratory-reactor MOCVD safety system
- 1 June 1986
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 75 (3), 421-428
- https://doi.org/10.1016/0022-0248(86)90084-9
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- A MOCVD reactor safety system for a production environmentJournal of Crystal Growth, 1984
- Routes to ultra-pure alkyls of indium and gallium and their adducts with ethers, phosphines and aminesJournal of Crystal Growth, 1984
- Implementation of a computer-controlled MOVPE system to grow epitaxial CMTJournal of Crystal Growth, 1984
- Metalorganic InP and Inx Ga1-x, Asy P1-y, on InP epitaxy at atmospheric pressureJournal of Electronic Materials, 1984
- Doping of Al0.35Ga0.65As grown by metal organic chemical vapor deposition with Zn or SeMaterials Letters, 1984