Deep Levels Associated with Nitrogen in Silicon

Abstract
Two deep levels at E c-0.19 eV and E c-0.28 eV are found in nitrogen-doped silicon, in which nitrogen is doped during crystal growth by the float-zone method. The E c-0.19 eV level has an electron capture cross section of 8×10-17 cm2 and the E c-0.28 eV level has that of 5×10-16 cm2. The concentrations of the former and latter levels are about 0.1 and 0.01% of the doped nitrogen concentration (∼1015 cm-3), respectively.