Electron-beam-induced deposition with carbon nanotube emitters
- 2 September 2002
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 81 (10), 1919-1921
- https://doi.org/10.1063/1.1504486
Abstract
Electron-beam-induced deposition (EBID) is performed with multiwalled carbon nanotube emitters that are assembled to atomic force microscope cantilevers through nanorobotic manipulations. A typical experiment shows that under 120 V bias, field emission current 2 μA occurs from a nanotube emitter. In comparison with conventional EBID with a Schottky-type electron gun of a field-emission scanning electron microscope (FESEM) in the same vacuum chamber, the deposition rate of the nanotube emitter reaches up to 12.2% of that of FESEM although the bias and the emission current are only 0.8% and 1.9% of those of FESEM (15 kV and 106 μA). The concept of parallel EBID is also presented.Keywords
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