Etching processes and characteristics for the fabrication of refractory x-ray masks
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6), 3577-3581
- https://doi.org/10.1116/1.590309
Abstract
No abstract availableKeywords
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