Nanometer scale electron beam lithography in inorganic materials
- 15 December 1984
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 45 (12), 1289-1291
- https://doi.org/10.1063/1.95115
Abstract
Nanometer scale holes and lines have been produced directly in calcium fluoride, aluminium oxide, and magnesium oxide by an intense beam of electrons. There is a threshold beam current density for drilling, and the variation of this with voltage has been studied. Observations using electron energy loss spectroscopy have confirmed that metallic aluminium is produced during the drilling of aluminium oxide. Aluminium oxide may be drilled when in contact with the aluminium substrate, which remains undrilled.Keywords
This publication has 5 references indexed in Scilit:
- High resolution electron beam lithography on CaF2Applied Physics Letters, 1984
- Fabrication of apertures, slots, and grooves at the 8–80 nm scale in silicon and metal filmsJournal of Vacuum Science & Technology B, 1983
- Electron beam writing on a 20-Å scale in metal β-aluminasApplied Physics Letters, 1983
- Thin-film CaF2 inorganic electron resist and optical-read storage mediumApplied Physics Letters, 1982
- I n s i t u vaporization of very low molecular weight resists using 1/2 nm diameter electron beamsJournal of Vacuum Science and Technology, 1981