In situ characterization by reflectance difference spectroscopy of III–V materials and heterojunctions grown by low pressure metal organic chemical vapour deposition
- 31 January 1990
- journal article
- Published by Elsevier in Materials Science and Engineering B
- Vol. 5 (2), 223-227
- https://doi.org/10.1016/0921-5107(90)90058-j
Abstract
No abstract availableKeywords
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