Ferroelectric properties and reliability of La-Sr-Co-O/Pb-La-Zr-Ti-O/La-Sr-Co-O heterostructures on si for non-volatile memory applications
- 19 August 1995
- journal article
- research article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 9 (4), 317-333
- https://doi.org/10.1080/10584589508012570
Abstract
Highly oriented La-Sr-Co-O(LSCO)/Pb-La-Zr-Ti-O(PLZT)/La-Sr-Co-O heterostructures have been successfully grown on a highly oriented Pt film which was grown on a thermally oxidized Si (SiO2/Si) substrate. The growth of oriented Pt film on the SiO2/Si substrate was made possible through the use of a thin bismuth titanate template layer which is c-axis oriented on the SiO2/Si substrate. The hybrid LSCO/Pt structure effectively reduced the sheet resistance of the electrodes by at least 3–5 times compared with a single LSCO electrode. These ferroelectric PLZT capacitors on Si exhibited symmetric hysteresis loops with very desirable ferroelectric properties. The test capacitors showed reliable performance at both room and high (100°C) temperatures with respect to fatigue, retention, aging, and imprint, suggesting that they can be used as reliable, nonvolatile memory elements.Keywords
This publication has 12 references indexed in Scilit:
- Control of structure and electrical properties of lead-zirconium-titanate-based ferroelectric capacitors produced using a layer-by-layer ion beam sputter-deposition techniqueApplied Physics Letters, 1994
- Effect of electrodes on the ferroelectric properties of pulsed-laser ablation-deposited PbZrXTi1-xO3thin film capacitorsFerroelectrics, 1994
- Ferroelectric La-Sr-Co-O/Pb-Zr-Ti-O/La-Sr-Co-O heterostructures on silicon via template growthApplied Physics Letters, 1993
- Effects of crystalline quality and electrode material on fatigue in Pb(Zr,Ti)O3 thin film capacitorsApplied Physics Letters, 1993
- Fatigue of ferroelectric PbZrxTiyO3 capacitors with Ru and RuOx electrodesJournal of Materials Research, 1993
- Fatigue and retention in ferroelectric Y-Ba-Cu-O/Pb-Zr-Ti-O/Y-Ba-Cu-O heterostructuresApplied Physics Letters, 1992
- Integration of ferroelectric thin films into nonvolatile memoriesJournal of Vacuum Science & Technology A, 1992
- A ferroelectric DRAM cell for high-density NVRAMsIEEE Electron Device Letters, 1990
- Integrated sol-gel PZT thin-films on Pt, Si, and GaAs for non-volatile memory applicationsFerroelectrics, 1990
- Ferroelectric MemoriesScience, 1989