Characteristics of thin films formed by the ionized-cluster beam technique
- 1 December 1978
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 45, 326-331
- https://doi.org/10.1016/0022-0248(78)90457-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ionized-cluster beam epitaxyJournal of Crystal Growth, 1978
- Ionized-cluster beam deposition and epitaxy as fabrication techniques for electron devicesThin Solid Films, 1977
- An evaluation of metal and semiconductor films formed by ionized-cluster beam depositionThin Solid Films, 1976
- Ionized-cluster beam depositionJournal of Vacuum Science and Technology, 1975