Ballistic electron transport in thin silicon dioxide films
- 15 March 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 35 (9), 4404-4415
- https://doi.org/10.1103/physrevb.35.4404
Abstract
Electron transport in thin (3.8–5.8-nm) silicon dioxide films has been investigated with use of the carrier-separation and vacuum-emission techniques. For the thinner films and smaller voltages, ballistic transport is inferred not only indirectly from the oscillations of the current-voltage characteristics (as originally reported by Lewicki and Maserjian) but also directly from the average energy measured via the carrier-separation technique and from the observation of the ballistic peak (about 0.15 eV wide) in the vacuum-emission experiments. In thicker films and/or at higher bias voltages, the transition from the ballistic to the steady-state regime is observed. Phonon replicas for the 0.153- and 0.063-eV longitudinal optical phonons have been observed in this transient situation. The experimental results have been compared to Monte Carlo simulations. Best agreement has been obtained by using a value of 0.7 for the polaron mass. The average mean free path of about 1 nm resulting from the simulation is in good agreement with Lewicki and Maserjian’s experimental data.
Keywords
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