3 nm NiCr wires made using electron beam lithography and PMMA resist
- 1 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4), 423-425
- https://doi.org/10.1016/0167-9317(95)00278-2
Abstract
No abstract availableKeywords
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