New studies of the Si-SiO2 interface using auger sputter profiling
- 31 March 1978
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 25 (9), 673-676
- https://doi.org/10.1016/0038-1098(78)90787-1
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Abstract: Stoichiometry of SiO2/Si interfacial regions. I. Ultrathin oxide filmsJournal of Vacuum Science and Technology, 1976
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- Surface states at steam-grown silicon-silicon dioxide interfacesIEEE Transactions on Electron Devices, 1966