The angular dependence of the sputter yield maxima
- 1 January 1976
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 27 (3-4), 223-227
- https://doi.org/10.1080/00337577608243040
Abstract
A relation based on planar-channeling is formulated capable of : redicting the angular position of the maxima of the sputter yield curve for mono and polycrystalline materials under both low and high energy sputtering conditions.Keywords
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