Effect of Alloying and Pressure on the Band Structure of Germanium and Silicon
- 15 August 1963
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 131 (4), 1524-1529
- https://doi.org/10.1103/physrev.131.1524
Abstract
The pseudopotential method has been used to compute the band structure of germanium-silicon alloys and the band structure of germanium under high pressure. In the former case the parameters were chosen from a linear interpolation between the parameters used previously for pure germanium and pure silicon, while in the latter case a simplified expression for the pseudopotential parameters based on the orthogonalized plane wave method was used to estimate their variation with lattice constant. The results are in reasonable agreement with experimental observations on the variation with pressure and alloying of the principal band edges. The calculations also indicate that the first absorption peak due to direct transitions should have a much larger pressure coefficient in Ge than in Si.Keywords
This publication has 25 references indexed in Scilit:
- Band Structure of the Intermetallic Semiconductors from Pressure ExperimentsJournal of Applied Physics, 1961
- Pressure dependence of the direct energy gap in germaniumJournal of Physics and Chemistry of Solids, 1960
- The effect of pressure on the properties of germanium and siliconJournal of Physics and Chemistry of Solids, 1959
- Intrinsic Optical Absorption in Germanium-Silicon AlloysPhysical Review B, 1958
- Galvanomagnetic Effects in a Semiconductor with Two Sets of Spheroidal Energy SurfacesPhysical Review B, 1956
- Magnetoresistance of Germanium-Silicon AlloysPhysical Review B, 1955
- Speculations on the Energy Band Structure of Ge—Si AlloysPhysical Review B, 1954
- Energy Gap of Germanium-Silicon AlloysPhysical Review B, 1954
- Some Properties of Germanium-Silicon AlloysPhysical Review B, 1954
- Pressure Dependence of the Resistivity of GermaniumPhysical Review B, 1954