A new approach for the fabrication of micromechanical structures
- 1 September 1989
- journal article
- Published by Elsevier in Sensors and Actuators
- Vol. 19 (3), 289-307
- https://doi.org/10.1016/0250-6874(89)87080-5
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Polysilicon microbridge fabrication using standard CMOS technologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Signal conditioning on the sensor chipSensors and Actuators, 1986
- CMOS — The emerging VLSI technologyIEEE Circuits and Devices Magazine, 1986
- A Self-Aliglned 1-/spl mu/m-Channel CMOS Technology with Retrograde n-Well and Thin EpitaxyIEEE Journal of Solid-State Circuits, 1985
- Polycrystalline Silicon Micromechanical BeamsJournal of the Electrochemical Society, 1983
- Silicon Micromechanical DevicesScientific American, 1983
- Silicon as a mechanical materialProceedings of the IEEE, 1982
- Fabrication of high-performance LDDFET's with Oxide sidewall-spacer technologyIEEE Transactions on Electron Devices, 1982
- A retrograde p-well for higher density CMOSIEEE Transactions on Electron Devices, 1981
- Silicon-gate n-well CMOS process by full ion-implantation technologyIEEE Transactions on Electron Devices, 1980