Properties and photovoltaic applications of microcrystalline silicon films prepared by rf reactive sputtering
- 15 July 1985
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 58 (2), 983-986
- https://doi.org/10.1063/1.336145
Abstract
Undoped, phosphorus-, and boron-doped microcrystalline silicon films were prepared by rf reactive sputtering, and their properties were investigated through structural, optical, and transport measurements. The merits of microcrystalline films for the p and n contacts in photovoltaic devices were demonstrated through the fabrication of single and tandem p-i-n solar-cell structures with best efficiencies between 5 and 6%.Keywords
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