Plasma source ion implantation: A new, cost-effective, non-line-of-sight technique for ion implantation of materials
- 15 December 1988
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 36 (3-4), 927-937
- https://doi.org/10.1016/0257-8972(88)90033-3
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Plasma source ion-implantation technique for surface modification of materialsJournal of Applied Physics, 1987
- Sheath thickness and potential profiles of ion-matrix sheaths for cylindrical and spherical electrodesJournal of Applied Physics, 1987
- U.S. Navy manufacturing technology program on ion implantationMaterials Science and Engineering, 1987
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Adherent TiN films produced by ion beam enhanced deposition at room temperatureNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Wear resistance of nitrogen-implanted steelsMaterials Science and Engineering, 1985
- A study of the improved wear performance of nitrogen-implanted Ti-6Al-4VWear, 1983
- Anomalous Boron Profiles Produced by BF 2 Implantation into SiliconJournal of the Electrochemical Society, 1980