Characterization of laser-annealed Si layers by ellipsometry
- 1 January 1979
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 42 (1-2), 29-34
- https://doi.org/10.1080/10420157908201733
Abstract
Ellipsometry has been used to investigate the effect of laser annealing on the 75As+-implanted layers of single crystal and polycrystalline Si by Q-switched Nd: YAG laser. Recovery of implantation-induced changes in optical constants by laser irradiation has been measured, and compared with observation by electron diffraction analysis and electrical measurement. Epitaxial regrowth of the layer implanted to 1016/cm2 occurs above 2–3 J/cm2 incident energy density. Good correlation has been obtained between the results by different analytical techniques. The threshold energy density for recrystallization decreases with increasing the implant dose due to increase in the absorption coefficient of the implanted surface layer. It has also been shown that implanted CVD polycrystalline Si layer can grow epitaxially on Si substrate by laser annealing.Keywords
This publication has 13 references indexed in Scilit:
- Time-resolved reflectivity of ion-implanted silicon during laser annealingApplied Physics Letters, 1978
- Implanted As Redistribution during Annealing in Oxidizing AmbientJournal of the Electrochemical Society, 1978
- A comparative study of laser and thermal annealing of boron-implanted siliconJournal of Applied Physics, 1978
- Unidirectional contraction in boron-implanted laser-annealed siliconApplied Physics Letters, 1978
- Spatially controlled crystal regrowth of ion-implanted silicon by laser irradiationApplied Physics Letters, 1978
- Investigation of ion-implanted GaP layers by ellipsometryJournal of Applied Physics, 1977
- Formation of Amorphous Silicon by Ion Bombardment as a Function of Ion, Temperature, and DoseJournal of Applied Physics, 1972
- Characterization of real surfaces by ellipsometrySurface Science, 1972
- ESR AND OPTICAL ABSORPTION STUDIES OF ION-IMPLANTED SILICONApplied Physics Letters, 1970
- ION IMPLANTATION DAMAGE OF SILICON AS OBSERVED BY OPTICAL REFLECTION SPECTROSCOPY IN THE 1 TO 6 eV REGIONApplied Physics Letters, 1969