The effect of substrate temperature on the physical properties of tantalum oxide thin films grown by reactive radio-frequency sputtering
- 26 November 2003
- journal article
- Published by Elsevier BV in Materials Research Bulletin
- Vol. 38 (14), 1841-1849
- https://doi.org/10.1016/j.materresbull.2003.08.003
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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