Growth of high quality epitaxial PbSe onto Si using a (Ca,Ba)F2 buffer layer
- 15 July 1985
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 47 (2), 133-135
- https://doi.org/10.1063/1.96239
Abstract
Epitaxial layers of PbSe have been grown onto Si(111) by vacuum deposition techniques using a (Ca,Ba)F2 buffer film. For lattice match, the buffer layer is graded with CaF2 at the Si interface and BaF2 at the PbSe interface. Like bulk BaF2, this buffer layer forms a suitable support for the growth of high quality PbSe. The layers grown exhibit smooth surfaces and mobilities as high as those of bulk PbSe, i.e., ∼3×104 cm2 V−1 s−1 at 77 K and >1.2×105 cm2 V−1 s−1 below 20 K. These results are very promising for the fabrication of heteroepitaxial monolithic integrated circuits, with, for example, photovoltaic (Pb,Sn) (S,Se,Te) narrow gap semiconductor infrared detectors on silicon.Keywords
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