Preparation of a CVD thin film by an atmospheric pressure low temperature surface discharge plasma torch
- 13 April 2006
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 15 (3), 328-331
- https://doi.org/10.1088/0963-0252/15/3/005
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Effects of Electrode Positioning on the Atmospheric‐Pressure DBD Plasma TorchPlasma Processes and Polymers, 2005
- The influence of electrode geometry and gas flow on corona-to-glow and glow-to-spark threshold currents in airJournal of Physics D: Applied Physics, 2001
- Deposition of silicon dioxide films with an atmospheric-pressure plasma jetPlasma Sources Science and Technology, 1998
- Spectral shape analysis of infrared absorption of thermally grown silicon dioxide filmsApplied Surface Science, 1997
- Kinetics and mechanism of silicon dioxide deposition through thermal pyrolysis of tetraethoxysilaneJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Low-pressure deposition of high-quality SiO2 films by pyrolysis of tetraethylorthosilicateJournal of Vacuum Science & Technology B, 1987