High temperature metal-induced crystallization of r.f. sputtered amorphous Si thin films
- 1 September 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 37 (3), 429-440
- https://doi.org/10.1016/0040-6090(76)90611-8
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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