Quantitative sputtering
- 1 January 1988
- journal article
- Published by Wiley in Surface and Interface Analysis
- Vol. 11 (1-2), 1-24
- https://doi.org/10.1002/sia.740110102
Abstract
No abstract availableKeywords
This publication has 110 references indexed in Scilit:
- Atomic structure of collision cascades in ion-implanted silicon and channeling effectsMaterials Letters, 1985
- Ion beam epiplantationJournal of Crystal Growth, 1982
- Angular distribution and differential sputtering yields for low-energy light-ion irradiation of polycrystalline nickel and tungstenApplied Physics A, 1980
- Characterization of thin films on metals using proton- induced X-raysThin Solid Films, 1979
- Hydrogen sputtering of carbon thin films deposited on platinumJournal of Nuclear Materials, 1977
- 14.1-MeV neutron sputtering of polycrystalline and monocrystalline niobium with different surface microstructuresJournal of Nuclear Materials, 1976
- A model calculation of the neutral molecule emission by sputtering processesZeitschrift für Physik B Condensed Matter, 1975
- Particle emission from solids under 14 MeV neutron impactJournal of Nuclear Materials, 1974
- Über die Kathodenzerstäubung bei schiefem Aufparall der IonenThe European Physical Journal A, 1942
- Bemerkung zur Theorie der KathodenzerstäubungThe European Physical Journal A, 1935