Oxide formation on the silicon (111) surface studied by Auger electron spectroscopy and by low energy electron loss spectroscopy
- 1 August 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 61 (2), 197-202
- https://doi.org/10.1016/0040-6090(79)90462-0
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
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