Modification of a 100-mA-class high-current oxygen implanter and its application to ultrathin film MOSFET/SIMOX
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 299-303
- https://doi.org/10.1016/0168-583x(89)90190-0
Abstract
No abstract availableKeywords
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