Cadmium diffusion in thin films
- 1 August 1997
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 12 (8), 966-969
- https://doi.org/10.1088/0268-1242/12/8/006
Abstract
Cadmium diffusion in thin films was studied in the temperature range 165 - . films were deposited by the flash evaporation technique. A thin film of cadmium was deposited and annealed at different temperatures. Cadmium depth profiles were determined by the Rutherford backscattering technique. These profiles were fitted to a complementary error function solution and the diffusion coefficients at four different temperatures were evaluated. The Arrhenius plot of the diffusion coefficients could be fitted to the equation . It is shown that the cadmium diffuses via copper vacancies.Keywords
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