Transient isothermal generation at the silicon-silicon oxide interface and the direct determination of interface trap distribution
- 31 May 1976
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 19 (5), 369-374
- https://doi.org/10.1016/0038-1101(76)90072-1
Abstract
No abstract availableKeywords
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