Model of d.c. magnetron reactive sputtering in ArO2 gas mixtures
- 1 November 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 289 (1-2), 140-146
- https://doi.org/10.1016/s0040-6090(96)08930-4
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Computational model of reactive sputteringJournal of Vacuum Science & Technology A, 1993
- Electron energy distribution function in a dc magnetron sputtering dischargeVacuum, 1992
- TiOx film formation process by reactive sputteringJournal of Vacuum Science & Technology A, 1992
- A model for reactive sputtering with magnetronsVacuum, 1989
- Cross Sections for Collisions of Electrons and Photons with Oxygen MoleculesJournal of Physical and Chemical Reference Data, 1989
- Predicting thin-film stoichiometry in reactive sputteringJournal of Applied Physics, 1988
- Electron transport parameters and excitation rates in argonJournal of Physics D: Applied Physics, 1983
- The problem of reactive sputtering and cosputtering of elemental targetsThin Solid Films, 1982
- Reaction of Oxygen with Si(111) and (100): Critical Conditions for the Growth of SiO2Journal of the Electrochemical Society, 1982
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969