The problem of reactive sputtering and cosputtering of elemental targets
- 25 June 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 92 (4), 371-380
- https://doi.org/10.1016/0040-6090(82)90162-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Current-Voltage Characteristic of Reactive Sputtering with Element TargetsPhysica Status Solidi (a), 1979
- Magnetron sputtering: basic physics and application to cylindrical magnetronsJournal of Vacuum Science and Technology, 1978
- Use of the ring gap plasmatron for high rate sputteringThin Solid Films, 1977
- D.C. cathode sputtering: influence of the oxygen content in the gas flow on the discharge currentThin Solid Films, 1976
- Über die chemische Reaktion bei der Bildung Dünner Schichten durch KondensationMonatshefte für Chemie / Chemical Monthly, 1964