Role of hydrogen in the preparation of sputtered microcrystalline silicon (μc-Si)
- 31 January 1988
- journal article
- Published by Elsevier in Solar Energy Materials
- Vol. 17 (1), 25-36
- https://doi.org/10.1016/0165-1633(88)90034-2
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Characterization of µc-Si:H Prepared by Photo-Chemical Vapor DepositionJapanese Journal of Applied Physics, 1986
- Photovoltaic properties of amorphous silicon produced by reactive sputteringSolar Energy Materials, 1986
- Properties and photovoltaic applications of microcrystalline silicon films prepared by rf reactive sputteringJournal of Applied Physics, 1985
- Electronic and transport properties of hydrogenated amorphous siliconPhysical Review B, 1985
- Some Properties of Intrinsic and Phosphorus Doped Amorphous Silicon Thin FilmsJapanese Journal of Applied Physics, 1983
- Microcrystalline Si: H Film and Its Application to Solar CellsJapanese Journal of Applied Physics, 1982
- Properties of amorphous hydrogenated silicon, with special emphasis on preparation by sputteringSolar Energy Materials, 1981
- Characterized of glow-discharge deposited a-Si:HSolar Energy Materials, 1980
- Black a-Si solar selective absorber surfacesJournal of Applied Physics, 1980
- Photoconductivity and absorption in amorphous SiJournal of Non-Crystalline Solids, 1973