Low‐Pressure Chemical Vapor Deposition of α‐Si3N4 from SiF4 and NH3: Kinetic Characteristics
- 1 August 1992
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 75 (8), 2200-2206
- https://doi.org/10.1111/j.1151-2916.1992.tb04484.x
Abstract
No abstract availableKeywords
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