Band-gap narrowing in heavily defect-doped ZnO
- 15 June 1982
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 25 (12), 7836-7839
- https://doi.org/10.1103/physrevb.25.7836
Abstract
Band-gap narrowing has been measured optically for semiconducting zinc-oxide films. All films were type with carrier densities of 5 × - 2 × . The narrowing appeared suddenly at , a carrier density consistent with that expected for the onset of a semiconductor-metal transition. However the gap-shrinkage dependence on carrier concentration was not as expected from predictions based on an electron-gas model, but could be described by the same empirical relation proposed for Si:As and Si:B.
This publication has 14 references indexed in Scilit:
- Properties of zinc oxide films prepared by the oxidation of diethyl zincJournal of Applied Physics, 1981
- Transparent and highly conductive films of ZnO prepared by rf reactive magnetron sputteringApplied Physics Letters, 1981
- Absorption edge shift in ZnO thin films at high carrier densitiesSolid State Communications, 1981
- Band-gap narrowing in heavily doped many-valley semiconductorsPhysical Review B, 1981
- Optical absorption in heavily doped siliconPhysical Review B, 1981
- Band tailing in heavily doped semiconductors. Scattering and impurity-concentration-fluctuation effectsPhysical Review B, 1981
- Energy gap in Si and Ge: Impurity dependenceJournal of Applied Physics, 1980
- Heavily doped semiconductors and devicesAdvances in Physics, 1978
- High-temperature transport in lanthanum strontium vanadateJournal of Physics C: Solid State Physics, 1976
- Dielectric Anomaly and the Metal-Insulator Transition in-Type SiliconPhysical Review Letters, 1975