Low-threshold disorder-defined buried heterostructure strained-layer AlyGa1−yAs-GaAs-InxGa1−xAs quantum well lasers (λ∼910 nm)

Abstract
The stability of strained‐layer Aly Ga1−yAs‐GaAs‐InxGa1−x As single quantum well heterostructures against thermal processing is examined using transmission and scanning electron microscopy. A self‐aligned impurity‐induced layer disordering process employing Si‐O diffusion is used to produce buried heterostructure stripe geometry lasers with a pseudomorphic InxGa1−x As quantum well active region. The 2‐μm‐wide stripe laser diodes exhibit high efficiency (η∼41%/facet), low threshold (Ith =7 mA), and high output power (Pout >20 mW/facet).