Contact reactions between amorphous silicon and single-crystal metallic films
- 1 September 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 53 (2), 129-134
- https://doi.org/10.1016/0040-6090(78)90025-1
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Contact metallurgy for shallow junction Si devicesJournal of Applied Physics, 1976
- Low temperature diffusion of Au into Si in the Si(substrate)-Au(film) systemThin Solid Films, 1975
- Atom movements occurring at solid metal-semiconductor interfacesJournal of Vacuum Science and Technology, 1974
- Analysis of thin-film structures with nuclear backscattering and x-ray diffractionJournal of Vacuum Science and Technology, 1974
- Metal contact induced crystallization in films of amorphous silicon and germaniumJournal of Non-Crystalline Solids, 1972