RADIATION DAMAGE IN RADIO-FREQUENCY-SPUTTERED SiO2 FILMS
- 1 October 1969
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 15 (7), 232-234
- https://doi.org/10.1063/1.1652981
Abstract
The optical absorption and electron spin resonance of atomic defects in rf‐sputtered SiO2 films have been measured. The properties of the centers are similar to those produced when pure, fused SiO2 is bombarded with neutrons.Keywords
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