A new e-beam method for grey scale 3D optical elements
- 31 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4), 209-212
- https://doi.org/10.1016/s0167-9317(99)00064-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Process latitude enhancement for 3D structure formation in e-beam lithographyMicroelectronic Engineering, 1997
- Proximity correction for e-beam patterned sub-500nm diffractive optical elementsMicroelectronic Engineering, 1997
- One-level gray-tone design — Mask data preparation and pattern transferMicroelectronic Engineering, 1996