Process latitude enhancement for 3D structure formation in e-beam lithography
- 28 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4), 487-490
- https://doi.org/10.1016/s0167-9317(96)00191-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Electron beam lithography using chemically-amplified resist: Resolution and profile controlMicroelectronic Engineering, 1996
- Efficiency enhancement of diffractive optical elements by variable relief profilingMicroelectronic Engineering, 1995
- Low energy lithography; energy control and variable energy exposureMicroelectronic Engineering, 1995
- New microlithography technologies based on resist irradiation by low energy electronsMicroelectronic Engineering, 1994