Improvement of PMMA electron-beam lithography performance in metal liftoff through a poly-imide bi-layer system
- 31 December 2010
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 87 (12), 2629-2632
- https://doi.org/10.1016/j.mee.2010.07.030
Abstract
No abstract availableKeywords
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