Characterization of Mo/Si Multilayer Structures by High-Resolution Electron Microscopy
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Interdiffusion and structural relaxation in Mo/Si multilayer filmsJournal of Applied Physics, 1988
- TEM and X-Ray Analysis of Multilayer Mirrors and BeamsplittersPublished by SPIE-Intl Soc Optical Eng ,1987
- High-resolution electron microscopy study of x-ray multilayer structuresJournal of Applied Physics, 1987
- Diffusion and structural relaxation in amorphous Mo/Si multilayersScripta Metallurgica, 1986
- A Structural Study of Co-Sb Multilayered Film by X-Ray DiffractionJapanese Journal of Applied Physics, 1986
- Magnetic and structural properties of Co-Cr multilayered structuresJournal of Magnetism and Magnetic Materials, 1986
- Molybdenum-silicon multilayer mirrors for the extreme ultravioletApplied Optics, 1985
- The preparation of cross‐section specimens for transmission electron microscopyJournal of Electron Microscopy Technique, 1984
- Superconducting properties of Nb/Ge metal semiconductor multilayersPhysical Review B, 1982
- Lattice spacings from lattice fringesUltramicroscopy, 1981