High rate sputtering techniques
- 19 June 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 80 (1-3), 1-11
- https://doi.org/10.1016/0040-6090(81)90201-7
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- Advances in high rate sputtering with magnetron-plasmatron processing and instrumentationThin Solid Films, 1979
- An introduction to closed field sputtering (CFS) equipmentVacuum, 1979
- The role of plasmatron/magnetron systems in physical vapor deposition techniquesThin Solid Films, 1978
- Some features of magnetron sputteringThin Solid Films, 1978
- Increase of Substrate Temperature in High Rate Coaxial Cylindrical Magnetron SputteringJapanese Journal of Applied Physics, 1978
- The characteristics of a modified planar-magnetron sputtering sourceVacuum, 1978
- Planar magnetron sputteringJournal of Vacuum Science and Technology, 1978
- Magnetron sputtering: basic physics and application to cylindrical magnetronsJournal of Vacuum Science and Technology, 1978
- Abstract: High-rate sputter deposition—circular magnetronsJournal of Vacuum Science and Technology, 1978
- dc magnetron system for cathode sputteringVacuum, 1976