Mechanical stresses in low pressure chemically vapour deposited silicon films
- 1 November 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 165 (1), 181-191
- https://doi.org/10.1016/0040-6090(88)90689-x
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Stress relaxation in thin aluminium filmsThin Solid Films, 1986
- Structure and crystal growth of atmospheric and low-pressure chemical-vapor-deposited silicon filmsJournal of Applied Physics, 1986
- Crystallization of amorphous silicon films during low pressure chemical vapor depositionApplied Physics Letters, 1983
- Low pressure deposition of polycrystalline silicon from silaneJournal of Crystal Growth, 1981
- Crystallization in amorphous siliconJournal of Applied Physics, 1979
- Viscous flow of thermal SiO2Applied Physics Letters, 1977
- Grain Growth and Stress Relief in Thin FilmsJournal of Vacuum Science and Technology, 1972