High-aspect-ratio photolithography for MEMS applications
- 1 January 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Journal of Microelectromechanical Systems
- Vol. 4 (4), 220-229
- https://doi.org/10.1109/84.475549
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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