Reactive and non-reactive high rate sputter deposition of Tungsten carbide
- 17 August 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 151 (3), 383-395
- https://doi.org/10.1016/0040-6090(87)90137-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- High rate reactive magnetron sputtered tungsten carbide filmsJournal of Vacuum Science & Technology A, 1985
- Synthesis of tungsten carbide films by rf magnetron sputteringJournal of Vacuum Science & Technology A, 1984
- The effect of bias on d.c. and r.f. sputtered WC-Co coatingsThin Solid Films, 1980
- Structural and compositional characterization of sputter-deposited WC+Co filmsJournal of Vacuum Science and Technology, 1978
- Friction and wear results from WC+Co coatings by −dc-biased rf sputtering in a helium atmosphereJournal of Vacuum Science and Technology, 1978
- Ancillary properties of vapor-deposited carbide coatingsThin Solid Films, 1977
- High speed friction and wear characteristics of vapor- deposited coatings of titanium carbide and tungsten carbide plus cobalt in a vacuum environmentThin Solid Films, 1977
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974