Advanced deep reactive ion etching: a versatile tool for microelectromechanical systems
- 1 December 1998
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 8 (4), 272-278
- https://doi.org/10.1088/0960-1317/8/4/003
Abstract
Advanced deep reactive ion etching (ADRIE) is a new tool for the fabrication of bulk micromachined devices. Different sensors and actuators which use ADRIE alone or combined with other technologies such as surface micromachining of silicon are presented here. These examples demonstrate the potential and the design freedom of this tool, allowing a large number of different shapes to be patterned and new smart devices to be realized.Keywords
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