Deposition of silicon carbide coatings on titanium alloy with a low pressure R.F. plasma
- 1 October 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 72 (3), 497-502
- https://doi.org/10.1016/0040-6090(80)90538-6
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge techniquePhilosophical Magazine, 1977
- Some considerations on the microwave electrodeless discharge: Plasma diagnostics in argon, helium or nitrogen atmospheresSpectrochimica Acta Part B: Atomic Spectroscopy, 1975
- Single−crystal β−SiC films by reactive sputteringApplied Physics Letters, 1975
- The growth of hetero-epitaxial SiC films by pyrolysis of various alkyl-silicon compoundsJournal of Crystal Growth, 1974