Relative performance of a variety of NF3+ hydrogen-donor transverse-discharge HF chemical-laser systems
- 1 September 1973
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 9 (9), 879-889
- https://doi.org/10.1109/jqe.1973.1077761
Abstract
No abstract availableKeywords
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